Key enabling technology for wafer-based manufacturing technology
نویسنده
چکیده
Photolithography is the engine that empowered semiconductor industry to reduce the minimum feature size of the components of a microchip from some 50 microns in the 1960s to below 14 nanometers today. Diffractive and refractive micro-optical components play a decisive role in modern photolithography systems, e.g. for laser line width narrowing, laser beam shaping (customized illumination), as phaseshift masks, for optical proximity correction, and for diffraction-based overlay. Wafer-based manufacturing of high-quality micro-optics and their importance for photolithography will be explained.
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